POCL3 or BBR3 Liquid Source Dopant Diffusion

In these processes, nitrogen carries the liquid source from a bubbler to the process tube where it reacts with oxygen to form a borosilicate or phosphosilicate glass. Dopant atoms then diffuse into the silicon to dope it.

  • Sheet Resistance: 1-100 Ω/□
  • Batch Size: 50
  • Gases: Nitrogen, Oxygen, Hydrogen
  • Uniformity: < 10%

Atmospheric Processes